|Message: Dichroic mirror implementation and a general OpticalSurface question.||Not Logged In (login)|
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Hello, I am trying to simulate a dichroic mirror/filter. I have manufacturing specs for wavelength-dependant Refelctivity, Transmission, and Absrobption.
I understand that out of the box in the latest G4.10.04 there is no such functionality. However there is a dichroic mirror surface (dielectric_dichroic), which allows for parametrized transmission/reflection.
I wanted to use it as a first step, and then create my own type of surface, which would also include absorbtion, in addition to transmission, the rest would be reflected then.
Now my question is quite simple:
Imagine I defined a G4Box for the dichroic filter/mirror. It is made out of glass(as material) so it does have an RINDEX, and so is the LiquidXenon in which it resides. But I also defined a surface (skinsurface) as a delectric_dichroic for it. That way, when an optical photon enters into it, it is is either reflected or transmitted. If it is transmitted it enters into the G4Box and later when it exits, does it also reflects or is transmitted (based on the data supplied)?
So in essense, effectively it will be undergoing those processes twice (once when entering, and once when exiting). Is this correct?
In that case, if for example the manufacturing specs is 50% reflected, and 50% transmitted. when a photon enters, it will be 50% transmitted, but to go through the mirror, it will have to cross the surface again, so another 50%.
Which results in effective transmittance of .5*.5 = .25 (25%)
Am I correct in this assumption?
thank you in advance.
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