|Message: Scoring Dose||Not Logged In (login)|
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I calculated the dose in a given layer using:
this calculates dose per event. Is it correct?
I calculated also the dose using Stopping powers from NIST.
the difference between the results obtained with Geant4 and NIST is large.
I irradiated a 100 nm thick Copper layer with an electron beam of Ee=300keV and I obtained: Dose: D1=1.408 mrad/event
from NIST stopping power I got: D2=1.754 mrad/event. The relative difference between these two values of the dose is about 24.6 % !! and for 300 nm SiO2 it is 23.6 % !!
Why there is such a large difference between Geant4 and NIST data?
in my simulation
density of SiO2: 2.5 g/cm3
Copper density is 8.94 g/cm3
PhysicsList: Low energy physics: Livermore model
There is a vacuum in the world volume.
If you need additional info, please let me know.
I kindly welcome your help.
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